Ion Implantation

Ion implantation is a materials engineering process by which ions of a material can be implanted into another solid, thereby changing the physical properties of the solid. Ion implantation is used in semiconductor device fabrication and in metal finishing, as well as various applications in materials science research. The ions introduce both a chemical change in the target, in that they can be a different element than the target, and a structural change, in that the crystal structure of the target can be damaged or even destroyed.
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a technique where Ions are accelerated to a high Energy and speed an injected into a Semiconductor. The dominant techniques for introducing Dopants into a Semiconductor. See also Ion Implanter.

B: (Fisika) penanaman (implantasi) ion
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