Dichlorosilane

Dichlorosilane (H2SiCl2), or DCS as it is commonly known, is usually mixed with ammonia (NH3) in LPCVD chambers to grow silicon nitride in semiconductor processing. A higher concentration of DCS:NH3 (ie 16:1), usually results in lower stress nitride films.
See more at Wikipedia.org...

chemical formula H2SiCl2, dichlorosilane is a flammable, corrosive, and is combustible in the range of 4.1-98.8%. Dichlorosilane has a strong pungent odor and is irritating to lungs, skin and eyes. Dichlorosilane is used in epitaxial and silicon nitride deposition.