Atomic Layer Deposition

Atomic Layer Deposition (ALD) is a gas phase chemical process used to create extremely thin coatings. The majority of ALD reactions use two chemicals, typically called s. These precursors react with a surface one-at-a-time in a sequential manner. By exposing the precursors to the growth surface repeatedly, a thin film is deposited.
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a deposition technique whereby pulses of gaseous reactants are used to deposit a film one layer at a time. See tech brief on Atomic Layer Deposition.