Chemical vapor deposition (CVD) is a
chemical process used to produce high-purity, high-performance solid materials. The process is often used in the
semiconductor industry to produce
thin films. In a typical CVD process, the
wafer (substrate) is exposed to one or more volatile s, which
react and/or
decompose on the substrate surface to produce the desired deposit. Frequently, volatile
byproducts are also produced, which are removed by gas flow through the reaction chamber.
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